Toggle navigation
Repositório da Associação das Universidades Confiadas a Compañía de Jesús na América Latina
español
português (Brasil)
English
português (Brasil)
español
português (Brasil)
English
Entrar
Toggle navigation
Ver item
Página inicial
Centro Universitario FEI
Documentos - CUFEI
Ver item
Página inicial
Centro Universitario FEI
Documentos - CUFEI
Ver item
JavaScript is disabled for your browser. Some features of this site may not work without it.
Using the wave layout style to boost the digital ICs electrical performance in the radioactive environment
Visualizar/
Abrir
Data
2015
Autor
Navarenho-De-Souza R.
Silveira M.A.G.
Gimenez S.P.
Metadata
Mostrar registro completo
URI
https://repositorio.fei.edu.br/handle/FEI/1460
Descrição
© The Electrochemical Society.This paper presents an experimental comparative study between the Metal-Oxide-Semiconductor Field Effect Transistors (MOSFET) manufactured with the Wave ("S" gate geometry) and the standard layout (CnM) considering the Total Ionizing Dose (TID) effects and taking into account that the devices were biased during the radiation procedure to emphasize the effects. Due to the special layout characteristics and the different effects of the bird's beaks regions of the Wave MOSFET (WnM) compared to the conventional rectangular layout, this innovative layout proposal for MOSFETs is able to improve the device TID tolerance without adding cost to the Complementary MOS (CMOS) manufacturing process.
Collections
Documentos - CUFEI
Buscar DSpace
Esta coleção
Navegar
Todo o repositório
Comunidades e Coleções
Por data do documento
Autores
Títulos
Assuntos
Esta coleção
Por data do documento
Autores
Títulos
Assuntos
Minha conta
Entrar
Cadastro