Cambiar navegación
Repositorio de la Asociación de Universidades Confiadas a la Compañía de Jesús en América Latina
español
português (Brasil)
English
español
español
português (Brasil)
English
Mi cuenta
Cambiar navegación
Ver ítem
Inicio
Centro Universitario FEI
Documentos - CUFEI
Ver ítem
Inicio
Centro Universitario FEI
Documentos - CUFEI
Ver ítem
JavaScript is disabled for your browser. Some features of this site may not work without it.
Boosting the total ionizing dose tolerance of digital switches by using OCTO SOI MOSFET
Ver/
Fecha
2015
Autor
De Souza Fino L.N.
Davini Neto E.
Da Silveira M.A.G.
Renaux C.
Flandre D.
Gimenez S.P.
Metadatos
Mostrar el registro completo del ítem
URI
https://hdl.handle.net/20.500.12032/89660
Descripción
© 2015 IOP Publishing Ltd.This paper performs an experimental comparative study of the total ionizing dose effects due to the x-ray radiation between the silicon-on-insulator (SOI) metal-oxide semiconductor field-effect transistors (MOSFETs) manufactured with octagonal gate geometry and the standard counterpart. Our main focus is on integrated transceivers for wireless communications and smart-power dc/dc converters for mobile electronics, where the transistor is used as the key switching element. It is shown that this innovative layout can reduce the total ionizing dose (TID) effects due to the special characteristics of the OCTO SOI MOSFET bird's beak regions, where longitudinal electrical field lines in these regions are not parallel to the drain and source regions. Consequently, the parasitic MOSFETs associated with these regions are practically deactivated.
Colecciones
Documentos - CUFEI
Buscar en el repositorio
Esta colección
Listar
Todo el repositorio
Comunidades y Colecciones
Por fecha de publicación
Autores
Títulos
Materias
Esta colección
Por fecha de publicación
Autores
Títulos
Materias
Mi cuenta
Mi cuenta
Registro