Comparison between the behavior of submicron Graded-Channel SOI nMOSFETs with fully- and partially-depleted operations in a wide temperature range
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Date
201-10-14Author
Michelly De Souza
EMAM, M.
VANHOENACKER-JANVIER, D.
RASKIN, J. P.
FLANDRE, D.
Marcelo Antonio Pavanello