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dc.contributor.authorGimenez S.P.
dc.contributor.authorLeoni R.D.
dc.contributor.authorRenaux C.
dc.contributor.authorFlandre D.
dc.date.accessioned2019-08-19T23:45:28Z
dc.date.accessioned2023-05-03T20:35:20Z
dc.date.available2019-08-19T23:45:28Z
dc.date.available2023-05-03T20:35:20Z
dc.date.issued2014
dc.identifier.citationGIMENEZ, S.P.; RENAUX, C.; LEONI, R.D.; FLANDRE, D.. Using diamond layout style to boost MOSFET frequency response of analogue IC. Electronics Letters, v. 50, n. 5, p. 398-400, 2014.
dc.identifier.issn0013-5194
dc.identifier.urihttps://hdl.handle.net/20.500.12032/88983
dc.description.abstractA way to improve the metal-oxide-semiconductor field effect transistor (MOSFET) analogue electrical performance, still little explored, is to modify their aspect form or ratio (AR) by the use of innovative layout styles. The diamond MOSFET (DM) is an example of this approach. It presents hexagonal gate geometry. This new layout structure for MOSFET induces two additional effects in comparison with the conventional (i.e. rectangular gate geometry) MOSFET (CM) counterpart, which improves the device's electrical performance: the longitudinal corner effect (LCE) and parallel association of MOSFET with different channel length effect (PAMDLE). How the diamond layout style (DLS) can significantly enhance the device's frequency response (FR) by using two different integrated circuits' (IC) complementary metal-oxide-semiconductor (CMOS) manufacturing process technologies (bulk and silicon-on-insulator (SOI)) is demonstrated. © 2014 The Institution of Engineering and Technology.
dc.relation.ispartofElectronics Letters
dc.rightsAcesso Restrito
dc.titleUsing diamond layout style to boost MOSFET frequency response of analogue IC
dc.typeArtigo


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