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Low temperature influence on the uniaxially strained FD SOI nMOSFETs behavior
(2007)
This work presents the impact of low temperature operation on the characteristics of uniaxially strained fully-depleted SOI nMOSFETs. Devices with channel lengths down to 160 nm were explored in the range 100-380 K. The ...
Analysis of uniaxial and biaxial strain impact on the linearity of fully depleted SOI nMOSFETs
(2007)
This work studies the impact of uniaxial, biaxial and combined uniaxial-biaxial strain on the linearity of nMOSFETs from a 65 nm fully depleted (FD) SOI technology. The total harmonic distortion (THD) and third-order ...
The low-frequency noise behaviour of graded-channel SOI nMOSFETs
(2007)
It is shown that the low-frequency noise in graded-channel (GC) SOI nMOSFETs is generally of the flicker or 1/f noise type. The corresponding input-referred noise spectral density is markedly higher than for the conventional ...
Evaluation of triple-gate FinFETs with SiO2-HfO2-TiN gate stack under analog operation
(2007)
This work presents the analog performance of nMOS triple-gate FinFETs with high-κ dielectrics, TiN gate material and undoped body from DC measurements. Different fin widths and devices with and without halo implantation ...