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Analysis of temperature variation influence on the analog performance of 45° rotated triple-gate nMuGFETs
(2012)
This work presents the analog performance of n-type triple-gate MuGFETs with high-k dielectrics and TiN gate material fabricated in 45° rotated SOI substrates comparing their performance with standard MuGFETs fabricated ...
Analog performance of standard and uniaxial strained triple-gate SOI FinFETs under x-ray radiation
(2014)
© 2014 IOP Publishing Ltd.The influence of x-ray irradiation on the main digital and analog parameters of triple gate silicon-on- insulator FinFETs is investigated for unstrained and uniaxially strained devices. Comparing ...
Improved operation of graded-channel SOI nMOSFETs down to liquid helium temperature
(2016)
© 2016 IOP Publishing Ltd.This paper presents the operation of Graded-Channel (GC) Silicon-On-Insulator (SOI) nMOSFETs at low temperatures down to liquid helium temperature in comparison to standard uniformly doped ...
SOI technology characterization using SOI-MOS capacitor
(2005)
In this paper a set of simple methods is presented, to determine the main parameters of the silicon on insulator technology, using a thin film SOI-MOS capacitor. Methods to obtain the effective substrate doping concentration, ...
Evaluation of graded-channel SOI MOSFET operation at high temperatures
(2006)
This paper presents a comparative analysis between graded-channel (GC) and conventional fully depleted SOI MOSFETs devices operating at high temperatures (up to 300 °C). The electrical characteristics such as threshold ...
Cryogenic operation of graded-channel silicon-on-insulator nMOSFETs for high performance analog applications
(2006)
We present in this work an analysis of the low temperature operation of Graded-Channel fully depleted Silicon-On-Insulator (SOI) nMOSFETs for analog applications, in the range of 100-300 K. This analysis is supported by a ...
In-depth low frequency noise evaluation of substrate rotation and strain engineering in N-type triple gate SOI Finfets
(2015)
© 2015 Elsevier B.V. All rights reserved.This work presents an experimental analysis of the low-frequency noise and the effective trap density of conventional, strained, rotated and strained-rotated SOI n-type FinFETs, ...
Different stress techniques and their efficiency on triple-gate SOI n-MOSFETs
(2015)
© 2014 Elsevier Ltd. All rights reserved.Three techniques to implement mechanical stress in n-channel Multiple Gate MOSFETs (MuGFETs) are investigated through 3D simulations and transconductance measurements. They are: ...
Low temperature influence on the uniaxially strained FD SOI nMOSFETs behavior
(2007)
This work presents the impact of low temperature operation on the characteristics of uniaxially strained fully-depleted SOI nMOSFETs. Devices with channel lengths down to 160 nm were explored in the range 100-380 K. The ...